We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Spin Cleaner.
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Spin Cleaner - List of Manufacturers, Suppliers, Companies and Products

Last Updated: Aggregation Period:Jul 09, 2025~Aug 05, 2025
This ranking is based on the number of page views on our site.

Spin Cleaner Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Jul 09, 2025~Aug 05, 2025
This ranking is based on the number of page views on our site.

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  3. マック産業機器 Saitama//Other manufacturing テクノロジーセンター
  4. 4 トービ Chiba//Electronic Components and Semiconductors
  5. 5 フクシマ Nagano//Manufacturing and processing contract 長野本社

Spin Cleaner Product ranking

Last Updated: Aggregation Period:Jul 09, 2025~Aug 05, 2025
This ranking is based on the number of page views on our site.

  1. Chemical liquid scrub spin cleaning device
  2. Tabletop spin cleaning device
  3. Alkaline-compatible spin cleaning device マック産業機器 テクノロジーセンター
  4. ME500-2611 Desktop Automatic Spin Cleaning Device マック産業機器 テクノロジーセンター
  5. 4 Small Spin Cleaning Device ME-510 マック産業機器 テクノロジーセンター

Spin Cleaner Product List

1~10 item / All 10 items

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Alkaline-compatible spin cleaning device

Ideal for organic EL substrate cleaning! Alkaline-compatible spin cleaning device.

This device manually sets the workpiece onto the main body, performs vacuum suction, and conducts two-liquid cleaning, ultrasonic cleaning, and N2 blow drying while spinning.

  • Other semiconductor manufacturing equipment

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ME500-2611 Desktop Automatic Spin Cleaning Device

Make effective use of limited space! It is a tabletop automatic spin cleaning machine.

This device is a tabletop automatic spin cleaner that manually sets the target workpiece and performs ultrasonic cleaning, pure water rinsing, and air blow drying through spin rotation.

  • Other semiconductor manufacturing equipment

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Automatic spin cleaning device

Automatic spin cleaning device equipped with a clean unit.

Cassette-type automatic device equipped with a clean unit that allows you to select option contents (the photo shows scrubbing cleaning + UV cleaning + hot plate) =============================================== <Specifications> Work size…Φ2 inches to Φ8 inches Transport…Atmospheric 3-axis clean robot Clean unit…HEPA filter Cleaning…Brush, MS standard equipment Options…High-pressure jet nozzle, UV, excimer, hot plate, etc. Utilities…Power supply, compressed air, nitrogen, pure water, exhaust, waste liquid, others

  • Other semiconductor manufacturing equipment

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Manual spin cleaning device

Simple design manual spin cleaning device

Multipurpose Manual Device with Simple Design ==================================== <Specifications> Work Size... Φ2 inches to Φ6 inches Cleaning... Disk brush, standard equipment 1.1MS Options... High-pressure jet nozzle, chemical solution nozzle, etc. Power Supply... AC100v or 200v CDA... 0.5MPA or more Pure Water... 0.2MPA or more Others In a constant temperature water tank

  • Other semiconductor manufacturing equipment

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Spin cleaning device

Cleaning without the use of chemicals instead of RCA cleaning.

Our company offers a "Spin Cleaning Device" that does not require chemical solutions, eliminating the need for conventional wastewater treatment facilities of a general scale. Since there are no skin irritations such as chemical burns, the working environment is improved. Additionally, due to its high cleaning and rinsing capabilities, it is possible to reduce the amount of pure water used. 【Features】 ■ Reduction of wastewater treatment load ■ Improvement of the working environment ■ Reduction of pure water usage *For more details, please download the PDF or feel free to contact us.

  • Other cleaning machines

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ME-1000 Leaf-Type Spin Cleaning Device

This is a device that performs brush cleaning, ultrasonic cleaning, rinse cleaning, and N2 blow drying processes!

This is a space-saving, double-sided washable mechanism for a sheet-type spin cleaning device. It is easy to maintain and features high-speed spin drying and N2 drying, which reduces water marks. (Patent No. 3558543)

  • Other semiconductor manufacturing equipment
  • Other cleaning machines

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ME-5000R Fully Automatic Wafer Spin Cleaning System

Full automatic spin cleaning device for 300mm/8-inch wafers, glass.

This device manually sets a wafer cassette into the main body, sends the stored target work to the spin cleaning section using a robot, and performs two-fluid cleaning, ultrasonic cleaning, and N2 blow drying while spinning, before storing it back in the wafer cassette.

  • Other semiconductor manufacturing equipment

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Small Spin Cleaning Device ME-510

The brush is cleaned with detergent (surfactants, etc.) by spinning rotation.

The "Compact Spin Cleaning Device ME-510" is a manual spinner that allows the operator to set the target workpiece manually. It performs brush cleaning with detergent (such as surfactants) through spin rotation, followed by pure water rinsing and air blow drying. The maximum rotation speed is 3000 rpm, and it accommodates sample sizes ranging from 30 to 150 mm, including PET film and glass. The brush section features brush elevation, rotation, and detergent supply, while the pure water supply section operates with a rotary air cylinder for pure water delivery. The main body dimensions are W650 x D800 x H710, and it has an aluminum frame. For more details, please contact us or refer to the catalog.

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